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Journal of Applied Physics : Mechanical behavior of stressed films on anisotropic substrates

By Conal E. Murray and K. L. Saenger

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Book Id: WPLBN0002169349
Format Type: PDF eBook :
File Size: Serial Publication
Reproduction Date: 18 November 2008

Title: Journal of Applied Physics : Mechanical behavior of stressed films on anisotropic substrates  
Author: Conal E. Murray and K. L. Saenger
Volume: Issue : November 2008
Language: English
Subject: Science, Physics, Natural Science
Collections: Periodicals: Journal and Magazine Collection, Journal of Applied Physics Collection
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Publication Date:
Publisher: American Institute of Physics

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Murray And K. L. Saenge, C. E. (n.d.). Journal of Applied Physics : Mechanical behavior of stressed films on anisotropic substrates. Retrieved from http://community.worldlibrary.net/


Description
Description: The effects of stressed thin films on substrates that possess anisotropic elasticity have been measured and modeled. Substrate curvature induced by a uniform, stressed film will be axisymmetric for substrates possessing greater than twofold in-plane symmetry, and anisotropic for twofold symmetric substrates. For a (011) Si substrate, the difference between the curvature along the 〈110〉 and 〈100〉 principal axes varies by approximately 47%. A simple, analytical formulation of the force and moment balance equations for elastically anisotropic films and substrates has been employed to calculate the dependence of curvature and strain on substrate orientation for several cases.

 

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